Poster "mask optimization" Papers

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BAME: Block-Aware Mask Evolution for Efficient N:M Sparse Training

Chenyi yang, Wenjie Nie, Yuxin Zhang et al.

ICML 2025

TokMan:Tokenize Manhattan Mask Optimization for Inverse Lithography

Yiwen Wu, Yuyang Chen, Ye Xia et al.

NEURIPS 2025

ILILT: Implicit Learning of Inverse Lithography Technologies

Haoyu Yang, Mark Ren

ICML 2024arXiv:2405.03574
7
citations